11210E500100 College of Engineering Seminar
工學院英文書報討論

主題 TOPIC
▸　Development Prospects of ALD Technology in Energy Applications

摘要 Abstract
❝　The atomic layer deposition (ALD) has been regarded as a promising deposition technique due to its gas phase deposition processes based on self-limiting and saturated surface reactions, which enable to achieve a required film-based material conformally on the high aspect ratio geometry with precise composition and thickness control. The ALD technique is recently employed to develop the functional thin film with low cost and high performance in energy applications. In this presentation, the growth mechanism of ALD is explained firstly and followed by a brief overview of its potential applications in energy fields. Some examples studied in our lab will be then introduced in the seminar.　 ❞

講者 SPEAKER
▸　王致喨教授 Prof. Chih-Liang WANG
▸　國立清華大學材料科學工程學系 Department of Materials Science and Engineering, National Tsing Hua University

時間 TIME
▸　2023/10/17 (TUE) 13:20 ~ 15:10

地點 VENUE
▸　化工館202教室 Classroom 202, Chemical Engineering Building